Sha Liu, Hongwang Zhang, Mark T. Swihart
American Institute of Chemical Engineers
|
Sha Liu, Guanying Chen, Tymish Y. Ohulchanskyy, Paras N. Prasad, Mark T. Swihart
American Institute of Chemical Engineers
|
Hongwang Zhang, Mark T. Swihart
American Institute of Chemical Engineers
|
Sha Liu, Guanying Chen, Tymish Y. Ohulchanskyy, Paras N. Prasad, Mark T. Swihart
American Institute of Chemical Engineers
|
Munish Sharma, Parham Rohani, Sha Liu, Mark Kaus, Mark T. Swihart
American Institute of Chemical Engineers
|
Sha Liu, Guanying Chen, Tymish Y. Ohulchanskyy, Paras N. Prasad, Mark T. Swihart
American Institute of Chemical Engineers
|
Munish Sharma, Parham Rohani, Sha Liu, Mark Kaus, Mark T. Swihart
American Institute of Chemical Engineers
|
Li, Xuegeng, He, Yuanqing, TaIukdar, Suddba S., Swihart, Mark T.
American Institute of Chemical Engineers
|
Sha Liu, Mark Kaus, Mark T. Swihart
American Institute of Chemical Engineers
|
Yuanqing He, Xuegeng Li, Mark T. Swihart
American Institute of Chemical Engineers
|
Swihart, Mark T., Talukdar, Suddha S., Li, Xuegeng
American Institute of Chemical Engineers
|
Suddha S. Talukdar, Mark T. Swihart
American Institute of Chemical Engineers
|