Suan Shi, V.S.K. Sajja, Y.Y. Lee
American Institute of Chemical Engineers
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Kenji Okano, Qiao Zhang, Tsutomu Tanaka, Hideki Fukuda, Akihiko Kondo
American Institute of Chemical Engineers
|
Suan Shi, V.S.K. Sajja, Y.Y. Lee
American Institute of Chemical Engineers
|
Naresh K. Budhavaram, Justin R. Barone
American Institute of Chemical Engineers
|
Suan Shi, V.S.K. Sajja, Y.Y. Lee
American Institute of Chemical Engineers
|
Naresh K. Budhavaram, Justin R. Barone
American Institute of Chemical Engineers
|
Jolly, Laure, Tornare, Veronique, Kochhar, Sunil
American Chemical Society
|
Edyta Szewczyk, Takao Kasuga, Zhiliang (Julia) Fan
American Institute of Chemical Engineers
|
Fan, Zhiliang, Lynd, Lee R.
American Institute of Chemical Engineers
|
Lucke, F. -K.
Springer-Verlag
|
Justin R. Barone, Naresh K. Budhavaram, Katherine J. Harvey
Materials Research Society
|
Amanda Hildebrand, Edyta Szewczyk, Takao Kasuga, Zhiliang (Julia) Fan
American Institute of Chemical Engineers
|