Blank Cover Image

Characterization of Cubic Mesoporous Tio2 Thin Films by Spectroscopic Ellipsometric Porosimetry Technique

Author(s):
Publication title:
2006 AIChE annual meeting, November 12-17, 2006, San Francisco, California, San Francisco Hilton : conference proceedings. Non-topical conferences
Title of ser.:
AIChE Conference Proceedings
Ser. no.:
P-235
Pub. Year:
2006
Pt.:
2
Pub. info.:
New York: American Institute of Chemical Engineers
ISBN:
9780816910120 [081691012X]
Language:
English
Call no.:
A08000/2006 [CD-ROM]
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Precise Characterization of Silicon on Insulator (SOI) and Strained Silicon on Si1-xGex on Insulator (SSOI) Stacks With Spectroscopic Ellipsometry

Sun, Lianchao, Fouere, Jean-Claude, Defranoux, Christophe, Heinrich, Patrice, Reis, Christine Dos, Emeraud, Thierry, …

Materials Research Society
7 Conference Proceedings Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Boher,P., Evrard,P., Piel,J.P., Stehle,J.L.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Precise characterization of ultrathin nitride/oxide gate dielectrics by grazing X-ray reflectance and spectroscopic ellipsometry

Boher, Pierre, Piel, Jean Philippe, Stehle, Jean Louis

MRS-Materials Research Society
8 Conference Proceedings Combined metrology in cluding VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Boher,P., Evrard,P., Piel,J.-P., Janicot,S., Stehle,J.-L.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings A new purged UV spectroscopic ellipsometer to characterize 157 nm nanolithographic materials

Boher, Pierre, Piel, Jean Philippe, Evrard, Patrick, Stehle, Jean Louis

MRS-Materials Research Society
9 Conference Proceedings High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis P. Stehle

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Precise Characterization of Resists and Thin Gate Dielectrics in the VUV Range for 157nm Lithography

Boher, Pierre, Evrard, Patrick, Piel, Jean Philippe, Defranoux, Christophe, Stehle, Jean Louis

Materials Research Society
10 Conference Proceedings * Characterization of ultra-thin Gate Dielectrics by Grazing X-Ray Reflectance and Spectroscopic Ellipsometry on the Same Instrument

Boher, P., Stehle, J.L., Defranoux, C., Bourtault, S., Piel, J.P., Evrard, P.

Electrochemical Society
5 Conference Proceedings Fast and Non Destructive Technique to Characterize Thin Film Porosity: Example on Cubic Mesoporous TiO2 Thins Films

A. Moreau, C. Defranoux, J.P. Piel, A. Bourgeois, M.O. Martin

Trans Tech Publications
11 Conference Proceedings Characterization Of Low-k Dielectric Films By Ellipsometric Porosimetry

Baklanov, M.R., Mogilnikov, K.P.

Materials Research Society
6 Conference Proceedings Ellipsometry porosimetry: fast and nondestructive technique to characterize porosity of cubic mesoporous TiO2 thin films

A. Bondaz, L. Kitzinger, C. Defranoux

SPIE - The International Society of Optical Engineering
12 Conference Proceedings SPECTROSCOPIC ELLIPSOMETRY AS A NON-DESTRUCTIVE TECHNIQUE FOR CHARACTERIZATION OF ATOMIC-SCALE INTERFACES

Stehle, J.L., Piel, J.P., Lecat, J.H., Pickering, C., Hammond, L.C.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12