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Athermal, Photonic Effects on Boron Diffusion and Activation in Silicon During Microwave Rapid Thermal Annealing

Author(s):
Publication title:
4th World Congress on Microwave and Radio Frequency Applications Abstracts
Title of ser.:
AIChE Conference Proceedings
Ser. no.:
P-213(4th World Congress on Microwave and Radio Frequency Applications)
Pub. Year:
2004
Page(from):
book055
Pages:
6
Pub. info.:
New York: American Institute of Chemical Engineers
ISBN:
9780816909650 [0816909652]
Language:
English
Call no.:
A08000/2004 [CD-ROM]
Type:
Conference Proceedings

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