Theoretical and Experimental Investigation of ILD Removal Rates, Coefficient of Friction, and Pad Flattening Ratio

Theoretical and Experimental Investigation of ILD Removal Rates, Coefficient of Friction, and Pad Flattening Ratio

Author(s):

Publication title:

Electrodeposition Processes in Semiconductor Device Fabrication

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-213(T8)

Pub. Year:

2004

Page(from):

91d

Pages:

8

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816909650 [0816909652]

Language:

English

Call no.:

A08000/2004 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061165
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting
Conf. info. (Number):	2004
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	2004.11.07-2004.11.12
Note for article:	AIChE Annual Meeting, November 7-12, 2004, Austin, Texas

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