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Photo-Electrochemical Properties of Titanium Dioxide Thin Films Prepared by Reactive RF Sputtering Method

Author(s):
Publication title:
Advanced Materials Science and Technology : Selected, peer reviewed papers from the 8th International Forum on Advanced Materials Science and Technology (IFAMST 8) August 1-4, 2012, Fukuoka Institute of Technology, Japan
Title of ser.:
Materials science forum
Ser. no.:
750
Pub. Year:
2013
Page(from):
248
Page(to):
251
Pages:
4
Pub. info.:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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