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Effects of Negative Bias Pulse on Characteristics of a-C:H Films Prepared by Plasma-Based Ion Implantation

Author(s):
Publication title:
Advanced material science and technology : selected, peer reviewed papers from the 7th International Forum on Advanced Material Science and Technology, June 26-28, 2011, Dalian, China (IFAMST-7)
Title of ser.:
Materials science forum
Ser. no.:
675-677
Pub. Year:
2011
Pt.:
2
Page(from):
1279
Page(to):
1282
Pages:
4
Pub. info.:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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