Blank Cover Image

Formation of High Density Metal Silicide Nanodots on Ultrathin SiO2 for Floating Gate Memory Application

Author(s):
Publication title:
THERMEC 2009, 6th International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Berlin, Germany, August 25-29, 2009
Title of ser.:
Materials science forum
Ser. no.:
638-642
Pub. Year:
2010
Pt.:
2
Page(from):
1725
Page(to):
1730
Pages:
6
Pub. info.:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Nucleation Control for High Density Formation of Si-based Quantum Dots on Ultrathin SiO2

K. Makihara, A. Kawanami, M. Ikeda, S. Higashi, S. Miyazaki

Electrochemical Society
7 Conference Proceedings Formation of Si Nanocrystals in SiOx Films Induced by Thermal Plasma Jet Annealing and Its Application to Floating Gate Memory

T. Okada, S. Higashi, H. Kaku, H. Furukawa, S. Miyazaki

Electrochemical Society
2 Conference Proceedings Characterization of Electronic Charged States of Si-Based Quantum Dots and Their Application to Floating Gate Memories

S. Miyazaki, M. Ikeda, K. Makihara

Electrochemical Society
8 Conference Proceedings Study of Charged States of Si Quantum Dots with Ge Core

K. Makihara, M. Ikeda, S. Higashi, S. Miyazaki

Electrochemical Society
3 Conference Proceedings Characterization of Electronic Charged States of Si-Based Quantum Dots for Floating Gate Application

S. Miyazaki, M. Ikeda, K. Makihara

Electrochemical Society
9 Conference Proceedings Novel SONOS and Floating-Gate Flash Memory Cell Structures for High Density and High Reliability Applications

R. Huang

Electrochemical Society
4 Conference Proceedings Characterization of Electronic Charged States of Nickel Silicide Nanodots Using AFM/ Kelvin Probe Technique

R. Nishihara, K. Makihara, Y. Kawaguchi, M. Ikeda, H. Murakami, S. Higashi, S. Miyazaki

Trans Tech Publications
10 Conference Proceedings Development of High Purity One ATM Ozone Source-Its Application to Ultrathin SiO2 Film Formation on Si Substrate

Koike, K., Inoue, G., Ichimura, S., Nakamura, K., Kurokawa, A., Nonaka, H.

MRS - Materials Research Society
5 Conference Proceedings Electronic Density of States at the Ultrathin SiO2/Si Interfaces

Hirose, M., Alay, J.L., Yoshida, T., Miyazaki, S.

Electrochemical Society
11 Conference Proceedings CVD Growth of Si Nanocrystals on Dielectricc Surfaces for Nanocrystal Floating Gate Memory Application

Madhukar, Sucharita, Smith, K., Muralidhar, R., O'Meara, D., Sadd, M., Nguyen, B-Y., White, B., Jones, B.

Materials Research Society
6 Conference Proceedings High Rate Growth of Highly-Crystallized Ge Films on Quartz from VHF Inductively-Coupled Plasma of GeH4+H2

T. Sakata, K. Makihara, H. Deki, S. Higashi, S. Miyazaki

Trans Tech Publications
12 Conference Proceedings Microscopic Understanding of PBTI and NBTI Mechanisms in High-κ / Metal Gate Stacks

M. Sato, K. Yamabe, K. Shiraishi, S. Miyazaki, K. Yamada

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12