Change in Surface States of Amorphous Carbon Nitride Films after Exposure to Oxygen Plasma
- Author(s):
- Publication title:
- THERMEC 2009, 6th International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Berlin, Germany, August 25-29, 2009
- Title of ser.:
- Materials science forum
- Ser. no.:
- 638-642
- Pub. Year:
- 2010
- Pt.:
- 1
- Page(from):
- 818
- Page(to):
- 823
- Pages:
- 6
- Pub. info.:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- Language:
- English
- Call no.:
- M23650
- Type:
- Conference Proceedings
Similar Items:
Trans Tech Publications |
Materials Research Society |
Materials Research Society |
Materials Research Society |
3
Conference Proceedings
Effects of Irradiation by Low Energy Nitrogen Ions on Carbon Nitride Thin Films
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
10
Conference Proceedings
Characterization of Carbon Nitride Films Prepared by Magnetic Filtered Plasma Deposition
MRS - Materials Research Society |
MRS-Materials Research Society |
11
Conference Proceedings
Nanomechanical properties of amorphous carbon and carbon nitride thin films prepared by shielded arc ion plating
MRS-Materials Research Society |
6
Conference Proceedings
Amorphous Carbon Nitride Films as a Candidate for Low-Dielectric Constant Materials
Materials Research Society |
12
Conference Proceedings
Surface and Bulk Microstructural Modifications in Amorphous Carbon Films After Post-Growth Low Energy Ion Beam Irradiation
Materials Research Society |