Improved wafer stepper alignment performance using an enhanced phase grating alignment system
- Author(s):
- Publication title:
- Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3677
- Pub. Year:
- 1999
- Vol.:
- 1
- Page(from):
- 382
- Page(to):
- 394
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431516 [0819431516]
- Language:
- English
- Call no.:
- P63600/3677
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Advances in process overlay: ATHENA alignment system performance on critical process layers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Baseline error-free non-TTL alignment system using oblique illumination for wafer steppers
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Flexible alignment mark design applications using a next generation phase grating alignment system
SPIE - The International Society of Optical Engineering |