Blank Cover Image

Sensitivity analysis of fitting for scatterometry

Author(s):
Publication title:
Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3677
Pub. Year:
1999
Vol.:
1
Page(from):
177
Page(to):
183
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431516 [0819431516]
Language:
English
Call no.:
P63600/3677
Type:
Conference Proceedings

Similar Items:

Logofatu,P.C., McNeil,J.R.

SPIE-The International Society for Optical Engineering

Raymond,C.J., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering

Logofatu,P.C., McNeil,J.R.

SPIE-The International Society for Optical Engineering

Raymond,C.J., Murnane,M.R., Prins,S.L., Naqvi,S.S.H., McNeil,J.R., Hosch,J.W.

SPIE-The International Society for Optical Engineering

Coulombe,S.A., Logofatu,P.C., Minhas,B.K., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering

Raymond,C.J., Murnane,M.R., Prins,S.L., Sohail,S., Naqvi,S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering

McNeil, J.R., Coulombe, S.A., Logofatu, P.C., Raymond, Christopher J., Naqvi, Sohail H., Collins, G.J.

SPIE

Gaspar, S. M., Hickman, K. C., McNeil, J. R., Jacobson, R. D., Lindauer, G. P., Strausser, Y. E., Krosche, E. R.

Materials Research Society

5 Conference Proceedings UV scatterometry

Logofatu, P.C.

SPIE-The International Society for Optical Engineering

M.R. Murnane, C.J. Raymond, S.S.H. Naqvi, J.R. McNeil

Society of Photo-optical Instrumentation Engineers

Raymond,C.J., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering

S.M.G. Wilson, H.M. Marchman, S.S.H. Naqvi, J.R. McNeil

Society of Photo-optical Instrumentation Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12