Material Aspects and Challenges for SOI FinFET Integration
- Author(s):
- Publication title:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment
- Title of ser.:
- ECS transactions
- Ser. no.:
- 13(1)
- Pub. Year:
- 2008
- Page(from):
- 223
- Page(to):
- 234
- Pages:
- 12
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566776264 [1566776260]
- Language:
- English
- Call no.:
- E23400/13-1
- Type:
- Conference Proceedings
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