Removal of Organic Wax and Particles on Silicon after Batch type Polishing by Ozonated DI Water

Removal of Organic Wax and Particles on Silicon after Batch type Polishing by Ozonated DI Water

Author(s):

Publication title:

Cleaning and surface conditioning technology in semiconductor device manufacturing 10

Title of ser.:

ECS transactions

Ser. no.:

11(2)

Pub. Year:

2007

Page(from):

79

Page(to):

84

Pages:

6

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775687 [156677568X]

Language:

English

Call no.:

E23400/11-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013286
Series ID:	PA00000034
Conf. info. (Name):	ECS Meeting
Conf. info. (Number):	212th
Conf. info. (Venue):	Washington, DC, USA
Conf. info. (Date):	2007.10.07-2007.10.12
Note for article:	212th ECS Meeting, October 7 - October 12, 2007, Washington, DC

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