Blank Cover Image

Iron Diffusion Profile Studies by Surface Photo-Voltage for Silicon Iron Implanted Wafers After Rapid Thermal Anneal

Author(s):
Publication title:
Solid-State Joint Posters (General)
Title of ser.:
ECS transactions
Ser. no.:
2(10)
Pub. Year:
2007
Page(from):
33
Page(to):
41
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775212 [1566775213]
Language:
English
Call no.:
E23400/2-9 [10]
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Novel Approach for Silicon Contamination Monitoring Using Surface Photo-voltage Measurements

I. Rapoport, P. Taylor, S. Kim, B. Orschel, W. Huber

Electrochemical Society
7 Conference Proceedings STUDY ON GEOMETRY, SURFACE DAMAGE AND RAPID THERMAL ANNEALING OF 300mm AS-CUT SILICON WAFERS

Zhang, G., Liu, B., Zhao, J., Chen, W., Wang, J., Zhou, Q., Tu, H.

Electrochemical Society
2 Conference Proceedings Photoluminescence as Complimentary Technique for Metals Contamination Monitoring After Thermal Processing

I. Rapoport, P. Taylor, S. Kim, B. Orschel

Electrochemical Society
8 Conference Proceedings Application Of Room-Temperature Photoluminescence For Characterizing As-Grown And Thermally Processed CZ Silicon Wafers

Kirscht, F., Orschel, B., Kim, S., Rouvimov, S., Snegirev, B., Fletcher, M., Shabani, M., Buczkowski, A.

Materials Research Society
3 Conference Proceedings WAFER SURFACE CONTAMINATION REDUCTION FROM SILICON CARBIDE COMPONENTS AT ELEVATED TEMPERATURES

I. Rapoport, P. Taylor, S.-B. Kim, B. Orschel, J. Kearns, Y. Narendar

Electrochemical Society
9 Conference Proceedings 14 Dose loss and diffusion in BF2-implanted silicon during Rapid Thermal Annealing

Dokumaci, O., Ronsheim, P., Hegde, S., Cobral, C., Jr.

Electrochemical Society
4 Conference Proceedings Iron Cross-Contamination Dynamics at Elevated Temperatures in Oxygen Gas Flow

I. Rapoport, P. Taylor, B. Orschel, F. Kirscht, J. Kearns

Electrochemical Society
10 Conference Proceedings 8 Characterization of Ultra-Shallow Implanted P+ Layer on P-Type Silicon Substrates after Flash Anneal and Conventional Rapid Thermal Anneal

Suzuki, T., Seto, M., Suzuki, N., Kang, K., Yoo, W. S.

Electrochemical Society
5 Conference Proceedings DIFFUSION AND ACTIVATION DURING RAPID THERMAL ANNEALING OF IMPLANTED BORON IN SILICON

Cowern, N.E.B., Yallup, K.J., Godfrey, D.J., Hasko, D.G., McMahon, R.A., Ahmed, H., Stobbs, W.M., McPhail, D.S.

Materials Research Society
11 Conference Proceedings Iron Deposition from SC-1 on Silicon Wafer Surfaces

Dhanda, S., Helms, C. R., Gupta, P. ("Kim"), Triplett, B. B., Tran, M.

MRS - Materials Research Society
6 Conference Proceedings STUDY ON GEOMETRY, SURFACE DAMAGE AND RAPID THERMAL ANNEALING OF 300mm AS-CUT SILICON WAFERS

Zhang, G., Liu, B., Zhao, J., Chen, W., Wang, J., Zhou, Q., Tu, H.

Electrochemical Society
12 Conference Proceedings Dry Oxidation and Implant Anneal in a Single Wafer Rapid Thermal Furnace

Fukada, T., Yoo, W.S., Hiraga, Y., Kang, K., Kitayama, H.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12