Mist Deposition for TFT Technology
- Author(s):
- Publication title:
- Thin Film Transistor Technology 8
- Title of ser.:
- ECS transactions
- Ser. no.:
- 3(8)
- Pub. Year:
- 2006
- Page(from):
- 255
- Page(to):
- 259
- Pages:
- 5
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566775083 [1566775086]
- Language:
- English
- Call no.:
- E23400/3-8
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
EFFECT OF SILICON SURFACE CONDITION ON FILM FORMATION USING MIST DEPOSITION
Electrochemical Society |
7
Conference Proceedings
49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |
5
Conference Proceedings
STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK
Electrochemical Society |
Electrochemical Society |
6
Conference Proceedings
Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method
Electrochemical Society |
Materials Research Society |