Investigation of Silicon-Germanium Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Laser Assistance

Investigation of Silicon-Germanium Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Laser Assistance

Author(s):

Publication title:

SiGe and Ge, materials, processing, and devices

Title of ser.:

ECS transactions

Ser. no.:

3(7)

Pub. Year:

2006

Page(from):

197

Page(to):

206

Pages:

10

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775076 [1566775078]

Language:

English

Call no.:

E23400/3-7

Type:

Conference Proceedings

Details

TDL ID:	ZA00047115
Series ID:	PA00000034
Conf. info. (Name):	SiGe and Ge Materials, Processing, and Devices Symposium ; Joint International Electrochemical Society Meeting ; Meeting of the Electrochemical Society ; Congreso de la Sociedad Mexicana de Electroquimica
Conf. info. (Number):	2nd ; 2006 ; 210th ; 21st
Conf. info. (Venue):	Cancun, Mexico
Conf. info. (Date):	2006.10.29-2006.11.03
Note for article:	210th ECS Meeting, October 29-November 3, 2006, Cancun, Mexico

Similar Items:

1 Conference Proceedings QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S. Materials Research Society	7 Conference Proceedings CHEMICAL VAPOR DEPOSITION OF SILICON FILMS USING HEXACHLORODISILANE Taylor, R.C., Scott, B.A., Lin, S.-T., LeGoues, F., Tsang, J.C. Materials Research Society
2 Conference Proceedings DEPOSITION OF HEAVILY-DOPED μc-SILICON THIN FILMS BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS (remote PECVD) Wang, C:, Bjorkman, C.H., Lee, D.R., Williams, M.J., Lucovsky, G. Materials Research Society	8 Conference Proceedings Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L. Electrochemical Society
3 Conference Proceedings Plasma Enhanced Chemical Vapor Deposition of Silicon Dioxide and Nitride Films Using the Enviromnentally Benign Precursor Diethylsilane Chen, L., Levy, R.A., Grow, J.M., Yu, Y. Electrochemical Society	9 Conference Proceedings DEPOSITION AND CHARACTERIZATION OF NEAR ‘INTRINSIC” μc-Si FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION -RPECVD Williams, M.J., Wang, C., Lucovsky, G. Materials Research Society
4 Conference Proceedings Laser Doping and Recrystallization for Amorphous Silicon Films by Plasma-Enhanced Chemical Vapor Deposition Wuu, D. S., Lien, S. Y., Wang, J. H., Mao, H. Y., Hsieh, I. C., Wu, B. R., Yao, P. C. Trans Tech Publications	10 Conference Proceedings SURFACE INVESTIGATIONS OF GERMANIUM CHEMICAL VAPOR DEPOSITION ON SILICON Michael Greenlief, C., Klug, Debra-Ann, Du, Wei, Keeling, Lori A. Materials Research Society
5 Conference Proceedings Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films Naskar, S., Bower, C. A., Yadon, L. N., Wolter, S. D., Stoner, B. R., Glass, J. T. Materials Research Society	11 Conference Proceedings High-Performance Low Temperature Poly-Silicon Thin Film Transistors Fabricated by Excimer Laser Irradiation with Bottom-Gate Scheme C. Tsai, H. Chen, Y. Lee, H. Cheng Electrochemical Society
6 Conference Proceedings Low Temperature Epitaxy of n-Doped Silicon Thin Films Using Plasma Enhanced Chemical Vapor Deposition Mahdi Farrokh Baroughi, Hassan G. El-Gohary, Cherry Y. Cheng, Siva Sivoththaman Materials Research Society	12 Conference Proceedings Optical and Compositional Analysis of Annealed SiOx Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition T. Roschuk, J. Wojcik, R Mascher Society of Vacuum Coaters

1

2

3

4

5

6

7

8

9

10

11

12