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HfO2 Atomic Layer Deposition Using HfCl4/H2O: The First Reaction Cycle

Author(s):
Publication title:
Atomic layer deposition applications 4
Title of ser.:
ECS transactions
Ser. no.:
16(4)
Pub. date:
2007
Page(from):
257
Page(to):
267
Pages:
11
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566776509 [1566776503]
Language:
English
Call no.:
E23400/11-4
Type:
Conference Proceedings

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