A Morphological, Chemical and Electrical Study of HfSiON Films for Inter Poly Dielectric Applications in Flash Memories

A Morphological, Chemical and Electrical Study of HfSiON Films for Inter Poly Dielectric Applications in Flash Memories

Author(s):

Publication title:

Physics and technology of high-k gate dielectrics 5

Title of ser.:

ECS transactions

Ser. no.:

11(4)

Pub. Year:

2007

Page(from):

497

Page(to):

508

Pages:

12

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775700 [1566775701]

Language:

English

Call no.:

E23400/11-4

Type:

Conference Proceedings

Details

TDL ID:	ZA00049542
Series ID:	PA00000034
Conf. info. (Name):	International Symposium on High Dielectric Constant Materials and Gate Stacks ; Meeting of the Electrochemical Society
Conf. info. (Number):	5th ; 212th
Conf. info. (Venue):	Washington, D.C., USA
Conf. info. (Date):	2007.10.08-2007.10.10
Note for article:	Fifth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Washington, DC from October 8 to 10, 200

Similar Items:

1 Conference Proceedings Structural and Chemical Investigation of Annealed Al₂O₃ Films for Interpoly Dielectric Application in Flash Memories A. Piagge, M. Caniatti, A. Del Vitto, C. Wiemer, G. Pavia, S. Alberici, E. Bellandi, A. Nale, M. Alessandri Electrochemical Society	7 Conference Proceedings Scatterometry feasibility studies for 0.13-micron flash memory lithography applications: enabling integrated metrology Lensing, K.R., Miller, C., Chudleigh, G., Swain, B., Laughery, M., Viswanathan, A. SPIE - The International Society of Optical Engineering
2 Conference Proceedings High-k Materials in Flash Memories M. Alessandri, R. Piagge, S. Alberici, E. Bellandi, M. Caniatti, G. Ghidini, A. Modelli, G. Pavia, E. Ravizza, A. … Electrochemical Society	8 Conference Proceedings Morphological and Electrical Study of Poly-SiGe Alloy Deposited by Vertical LPCVD Teixeira, R. C., Doi, I., Zakia, M. B. P., Diniz, J. A. Electrochemical Society
3 Conference Proceedings Crystallization Behavior of Hf-Rich Aluminates and Influence on Film Dielectric Properties Climent, M., Crivelli, B., Righini, G., Alberici, S., Alessandri, M., Elbaz, A.C., Pavia, G., Wiemer, C. Materials Research Society	9 Conference Proceedings Optimization of LPCVD Nitride Deposition Conditions for Non-Volatile Memory Inter Poly Dielectric Applications Teeperi, M.J., van Wiek, M.A.A.M., Sprey, H. Electrochemical Society
4 Conference Proceedings Ultrathin NO/N2O oxynitride dielectric for advanced flash memory application: Single wafer and batch technology Zonca, R., Crivelli, B., Polignano, M. L., Cazzaniga, F., Alessandri, M., Caricato, A. P., Bersani, M., Sbetti, M., … MRS-Materials Research Society	10 Conference Proceedings Characterization of Chemical-Mechanical Polishing of Inter-Metal Dielectric Film S. Morimoto, R. Breivogel, R. Gasser, S. Louke, P. Moon, R. Patterson, M. Prince Electrochemical Society
5 Conference Proceedings Physical-Chemical Evolution of Hf-Aluminates Upon Thermal Treatments Crivelli, B., Alessandri, M., Alberici, S., Brazzelli, D., Elbaz, A. C., Frabboni, S., Ghidini, G., Maes, J. W., … Materials Research Society	11 Conference Proceedings Optimal proximity correction: application for flash memory design Chen,Y.G., Huang,D.L., Sung,K.T., Chiang,J.J., Yu,M., Teng,F., Chu,L., Rey,J.C., Bernard,D.A., Li,J., Moroz,V., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Composition Dependence of Physical and Electrical Properties of HfSiON Films as Alternative Gate Dielectrics A. Nishiyama, M. Koike, Y. Kamimuta, M. Suzuki, T. Ino, M. Koyama Electrochemical Society	12 Conference Proceedings *WET CHEMICAL DERIVED FILMS FOR ELECTRICAL APPLICATIONS Uhlmann, D. R., Teowee, G., Boulton, J. M., Zelinski, B. J. J. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12