W. Lee, C. Chao, X. Jiang, J. Hwang, S. Bent
Electrochemical Society
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Jonathan G. Baker, Stacey F. Bent, A.J.M. Mackus
American Institute of Chemical Engineers
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
X. Jiang, F. Prinz, S. Bent
Electrochemical Society
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Xiaodan Cui, Alan D. Zdunek, Christos G. Takoudis
American Institute of Chemical Engineers
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Y. Zhen, S. Jiang, A. Tok
Electrochemical Society
|
J. Shim, F. Prinz
Electrochemical Society
|
X.J. Chen, K.A. Khor, S.H. Chan, S.P. Jiang
Electrochemical Society
|
Jonathan G. Baker, Stacey F. Bent, A.J.M. Mackus
American Institute of Chemical Engineers
|
Joseph Singh, Stacey F. Bent, Nuoya Yang
American Institute of Chemical Engineers
|