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HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method

Author(s):
Publication title:
Atomic layer deposition applications 2
Title of ser.:
ECS transactions
Ser. no.:
3(15)
Pub. date:
2007
Page(from):
89
Page(to):
98
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775427 [1566775426]
Language:
English
Call no.:
E23400/3-15
Type:
Conference Proceedings

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