Blank Cover Image

Radiation Hard 0.25 Micron CMOS Library at IHP

Author(s):
U. Jagdhold  
Publication title:
DASIA 2008 : Data Systems In Aerospace, 27–30 May 2008, Palma de Majorca, Spain
Title of ser.:
ESA SP
Ser. no.:
665
Pub. Year:
2008
Pages:
3
Pub. info.:
Noordwijk, The Netherlands: ESA Communications
ISSN:
1609042X
ISBN:
9789292212292 [929221229X]
Language:
English
Call no.:
E11690/665
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Radiation Hard 0.13 Micron CMOS Library at IHP

U. Jagdhold

ESA Communications
7 Conference Proceedings TCAD And Its Application In 0.25um CMOS Process And Integration

Tung, Jeffrey, Aronowitz, Sheldon

Electrochemical Society
2 Conference Proceedings Creation of a Radiation Hard 0.13 Micron CMOS Library at IHP

U. Jagdhold

ESA Communications
8 Conference Proceedings Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology

Kizilyalli,I.C., Huang,R.Y., Hwang,D., Kane,B.C., Ashton,R., Kuehne,S., Deng,X., Twiford,M.S., Martin,E.P., …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Total Dose Radiation Response of 0.25 Micron SOI PD CMOS Transistors

Liu, M., Jenkins, W., Barge, T.

Electrochemical Society
9 Conference Proceedings "2.5-V, 1-Gb/s/ch parallel optical receiver in 0.25-μm CMOS technology"

Jung,S.-J., Kim,H.-S., Kim,D.-G., Choi,Y.-W.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using Source/Drain and Silicide Process Modules and Their Interactions

Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K.

MRS - Materials Research Society
10 Conference Proceedings Stability of Advanced Photoresist Systems for Sub-0.25 Micron Lithography during Reactive Ion Etch Processes

Naeem, M.D., Yan, W., Zhu, J.

Electrochemical Society
5 Conference Proceedings A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using S/D and Silicide Process Modules and Their Interactions

Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K.

MRS - Materials Research Society
11 Conference Proceedings Etching Sub-0.25 um Micron Dual Damascene Structures by High Density Plasmas

Chaudhary, N., Cowley, A., Dobuzinsky, D.

Electrochemical Society
6 Conference Proceedings Telecommunications LSIs using 0.25 μm CMOS/SIMOX technology

Takeya, K.

Electrochemical Society
12 Conference Proceedings The Challenge and Methods of TEM Cross-Sectioning of <0.25-Micron Plugs

Hunt, C. Amy, Zhang, Yuhong, Su, David

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12