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Methods for increasing the etching uniformity of ion beam multiple mask

Author(s):
  • X. Zhang ( Univ. of Science and Technology of China, China )
  • Y. Xiong ( Univ. of Science and Technology of China, China )
  • Q. Liu ( Univ. of Science and Technology of China, China )
  • Y. Tian ( Univ. of Science and Technology of China, China )
Publication title:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7282
Pub. Year:
2009
Vol.:
1
Page(from):
728213-1
Page(to):
728213-5
Pages:
5
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475428 [0819475424]
Language:
English
Call no.:
P63600/7282
Type:
Conference Proceedings

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