Blank Cover Image

Design of a 0.25 THz second harmonic gyrotron oscillator

Author(s):
  • Y. Huang ( Univ. of Electronic Science and Technology of China, China )
  • H. Li ( Univ. of Electronic Science and Technology of China, China )
Publication title:
Photonics and Optoelectronics Meetings (POEM) 2008 : terahertz science and technology, 24-27 November 2008 Wuhan, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7277
Pub. Year:
2009
Page(from):
72770K-1
Page(to):
72770K-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475367 [081947536X]
Language:
English
Call no.:
P63600/7277
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Sensing Properties of Ba1-xLaxNbyTi1-yO3 (x=0.25, y=0.25) Thin-Film on SiO2/Si Substrate

Li, B., Lai, P.T., Li, G.Q., Zeng, S.H., Huang, M.Q.

Materials Research Society
7 Conference Proceedings Silicide Contacts for Sub-0.25 ｦﾌm Devices

Chen, L. J., Cheng, S. L., Chang, S. M., Peng, Y. C., Huang, H. Y., Cheng, L. W.

MRS - Materials Research Society
2 Conference Proceedings Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology

Kizilyalli,I.C., Huang,R.Y., Hwang,D., Kane,B.C., Ashton,R., Kuehne,S., Deng,X., Twiford,M.S., Martin,E.P., …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Double patterning with multilayer hard mask shrinkage for sub-0.25 k1 lithography

H. J. Liu, W. H. Hsieh, C. H. Yeh, J. S. Wu, H. W. Chan, W. B. Wu, F. Y. Chen, T. Y. Huang, C. L. Shih, J. P. Lin

SPIE - The International Society of Optical Engineering
3 Conference Proceedings A 1.2V 0.25-μm clock output pixel sensor with wide dynamic range

Lai, C. -H., King, Y. -C., Huang, S. -Y.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Degradation of Rhombohedral (Y0.25Bi0.75)2O3 Solid Electrolyte

Huang, C.-C., Fung, K.-Z.

Electrochemical Society
4 Conference Proceedings Phase locking of a second harmonic gyrotron using a quasi-optical circulator

D.J. Hoppe, R.M. Perez, A.M. Bhanji, H.Z. Guo, J. Rogers

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool

A.D. Katnani, D. Schepis, R.W. Kwong, W. Huang, Z.C.H. Tan

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Strong phase shifter mask application to 0.25-µm and 0.35-µm technologies

G. Li, Y.-C. Ku, W.H. Lea

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Effects of LiF on Sintering Temperature and Microwave Dielectric Properties of …

Y.J. Gu, J.L. Huang, X.J. Han, Q. Li, X. Wang

Trans Tech Publications
6 Conference Proceedings Lithography for manufacturing at 0.25 Micrometer and Below

Smith J. H., Schattenburg L. M.

Kluwer Academic Publishers
12 Conference Proceedings Optimizing 0.25-µm lithography using confocal microscopy

R.E. Colgan, H.M. Marchman

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12