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Wet anisotropic etching by TMAH with NCW-1002 surfactant on crystalline silicon surface

Author(s):
  • Y. W. Xu ( Univ. of New South Wales, Australia )
  • A. Michael ( Univ. of New South Wales, Australia )
  • C. Y. Kwok ( Univ. of New South Wales, Australia )
Publication title:
Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7269
Pub. date:
2008
Page(from):
72690U-1
Page(to):
72690U-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475213 [0819475211]
Language:
English
Call no.:
P63600/7269
Type:
Conference Proceedings

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