Measurement of photoelectrons decay in doping AgCl by microwave absorption phase-sensitive technique

Measurement of photoelectrons decay in doping AgCl by microwave absorption phase-sensitive technique

Author(s):

X. Dai ( Hebei Univ., China )
G. Dong ( Hebei Univ., China )
H. Liu ( Hebei Univ., China )
X. Li ( Hebei Univ., China )
S. Yang ( Hebei Univ., China )

Publication title:

Optoelectronic measurement technology and applications : 2008 International Conference on Optical Instruments and Technology : 16-19 November 2008, Beijing, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7160

Pub. Year:

2009

Page(from):

71601P-1

Page(to):

71601P-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819474049 [0819474045]

Language:

English

Call no.:

P63600/7160

Type:

Conference Proceedings

Details

TDL ID:	ZA00052791
Series ID:	PA00000029
Conf. info. (Name):	International Conference on Optical Instruments and Technology
Conf. info. (Number):	2008
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2008.11.16-2008.11.19
Note for article:	2008 International Conference on Optical Instruments and Technology, 16-19 November 2008, Beijing, China - Poster Session, 71601P, 7160-37

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