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High aspect ratio grating fabrication in SU-8 resist by UV-curing nanoimprint

Author(s):
  • X. Wang ( Hefei Univ. of Technology, China )
  • L. Ge ( Univ. of Science and Technology of China, China )
  • J. Lu ( Hefei Univ. of Technology, China )
  • S. Fu ( Univ. of Science and Technology of China, China )
Publication title:
2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7159
Pub. date:
2009
Page(from):
71590K-1
Page(to):
71590K-5
Pages:
5
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819474032 [0819474037]
Language:
English
Call no.:
P63600/7159
Type:
Conference Proceedings

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