Residual stress in silicon wafer using IR polariscope

Residual stress in silicon wafer using IR polariscope

Author(s):

Z. Lu ( Nanyang Technological Univ., Singapore )
P. Wang ( Nanyang Technological Univ., Singapore )
A. Asundi ( Nanyang Technological Univ., Singapore )

Publication title:

Ninth International Symposium on Laser Metrology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7155

Pub. Year:

2008

Vol.:

1

Page(from):

715512-1

Page(to):

715512-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473981 [0819473987]

Language:

English

Call no.:

P63600/7155

Type:

Conference Proceedings

Details

TDL ID:	ZA00052786
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Laser Metrology
Conf. info. (Number):	2008 : 9th
Conf. info. (Venue):	Singapore
Conf. info. (Date):	2008.06.30-2008.07.02
Note for article:	9th International Symposium on Laser Metrology, June 30-July 2 2008, Singapore - Photoelasticity and Birefringence Technology, 715512, 7155-37

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