Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials

Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials

Author(s):

S. K. Kim ( SAMSUNG Cheil Industries, Inc., Republic of Korea )
H. M. Cho ( SAMSUNG Cheil Industries, Inc., Republic of Korea )
C. Woo ( SAMSUNG Cheil Industries, Inc., Republic of Korea )
S. R. Koh ( SAMSUNG Cheil Industries, Inc., Republic of Korea )
M. Kim ( SAMSUNG Cheil Industries, Inc., Republic of Korea )

Publication title:

Lithography Asia 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7140

Pub. Year:

2008

Vol.:

2

Page(from):

71402V-1

Page(to):

71402V-7

Pages:

7

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

Language:

English

Call no.:

P63600/7140

Type:

Conference Proceedings

Details

TDL ID:	ZA00052771
Series ID:	PA00000029
Conf. info. (Name):	Lithography Asia
Conf. info. (Number):	2008
Conf. info. (Venue):	Taipei, Taiwan
Conf. info. (Date):	2008.11.04-2008.11.06
Note for article:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - Advanced Materials, 71402V, 7140-104

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