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Use of spin-on-hard mask materials for nano scale patterning technology

Author(s):
  • W.-H. Wu ( National Chiao Tung Univ., Taiwan )
  • E. Y. Chang ( National Chiao Tung Univ., Taiwan )
  • H.-S. Cheon ( Samsung Cheil Industries, Inc., Republic of Korea )
  • S. K. Kim ( Samsung Cheil Industries, Inc., Republic of Korea )
  • H. M. Cho ( Samsung Cheil Industries, Inc., Republic of Korea )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
2
Page(from):
71402Q-1
Page(to):
71402Q-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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