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CD uniformity improvement for 3x nm node devices

Author(s):
  • C.-M. Park ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H.-B. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H.-D. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H.-W. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • C.-H. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
2
Page(from):
714024-1
Page(to):
714024-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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