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Alternative technology for double patterning process simplification

Author(s):
  • H.-Y. Lim ( Hynix Semiconductor Inc., Republic of Korea )
  • K.-Y. Jang ( Hynix Semiconductor Inc., Republic of Korea )
  • J.-H. Kim ( Hynix Semiconductor Inc., Republic of Korea )
  • S.-G. Lee ( Hynix Semiconductor Inc., Republic of Korea )
  • S. Park ( Hynix Semiconductor Inc., Republic of Korea )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. date:
2008
Vol.:
1
Page(from):
714020-1
Page(to):
714020-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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