
Alternative technology for double patterning process simplification
- Author(s):
- H.-Y. Lim ( Hynix Semiconductor Inc., Republic of Korea )
- K.-Y. Jang ( Hynix Semiconductor Inc., Republic of Korea )
- J.-H. Kim ( Hynix Semiconductor Inc., Republic of Korea )
- S.-G. Lee ( Hynix Semiconductor Inc., Republic of Korea )
- S. Park ( Hynix Semiconductor Inc., Republic of Korea )
- Publication title:
- Lithography Asia 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7140
- Pub. date:
- 2008
- Vol.:
- 1
- Page(from):
- 714020-1
- Page(to):
- 714020-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473813 [0819473812]
- Language:
- English
- Call no.:
- P63600/7140
- Type:
- Conference Proceedings
Similar Items:
1
![]() SPIE - The International Society of Optical Engineering |
7
![]() Electrochemical Society |
2
![]() SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
![]() Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
![]() SPIE - The International Society of Optical Engineering |
5
![]() Trans Tech Publications |
Trans Tech Publications |
6
![]() SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |