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Removal of particles from lithographic masks through plasma-assisted cleaning by metastable atomic neutralization

Author(s):
  • W. M. Lytle ( Univ. of Illinois at Urbana-Champaign, United States )
  • D. S. Szybilski ( Univ. of Illinois at Urbana-Champaign, United States )
  • C. E. Das ( Univ. of Illinois at Urbana-Champaign, United States )
  • R. Raju ( Univ. of Illinois at Urbana-Champaign, United States )
  • V. Surla ( Univ. of Illinois at Urbana-Champaign, United States )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
71401S-1
Page(to):
71401S-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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