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A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

Author(s):
  • C.-H. Liu ( National Taiwan Univ., Taiwan )
  • H.-T. Ng ( National Taiwan Univ., Taiwan )
  • P. C. W. Ng ( National Taiwan Univ., Taiwan )
  • K.-Y. Tsai ( National Taiwan Univ., Taiwan )
  • S.-J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
71401I-1
Page(to):
71401I-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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