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Methodology of flare modeling and compensation in EUVL

Author(s):
  • I. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H. Kong ( ASML, Republic of Korea )
  • C. Park ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J.-O. Park ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J. Lee ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
714009-1
Page(to):
714009-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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