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Deposition of nanocrystalline SiC films using helicon wave plasma enhanced chemical vapor deposition

Author(s):
  • W. Lu ( Hebei Univ., China )
  • W. Yu ( Hebei Univ., China )
  • L. Ma ( Hebei Univ., China )
  • L. Wu ( Hebei Univ., China )
  • G. Fu ( Hebei Univ., China )
Publication title:
Optoelectronic Materials and Devices III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7135
Pub. Year:
2008
Vol.:
2
Page(from):
71353F-1
Page(to):
71353F-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473752 [0819473758]
Language:
English
Call no.:
P63600/7135
Type:
Conference Proceedings

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