Study of x-ray lithography mask distortion during electron-beam writing
- Author(s):
- Publication title:
- Optoelectronic technology and instruments, control theory and automation, and space exploration : Seventh International Symposium on Instrumentation and Control Technology : 10-13 October 2008, Beijing, China
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7129
- Pub. Year:
- 2008
- Page(from):
- 712909-1
- Page(to):
- 712909-6
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473639 [0819473634]
- Language:
- English
- Call no.:
- P63600/7129
- Type:
- Conference Proceedings
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