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Study of x-ray lithography mask distortion during electron-beam writing

Author(s):
  • H. Shang ( Shanghai Maritime Univ., China )
  • Y. Wang ( Beijing Univ. of Aeronautics and Astronautics, China )
Publication title:
Optoelectronic technology and instruments, control theory and automation, and space exploration : Seventh International Symposium on Instrumentation and Control Technology : 10-13 October 2008, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7129
Pub. Year:
2008
Page(from):
712909-1
Page(to):
712909-6
Pages:
6
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473639 [0819473634]
Language:
English
Call no.:
P63600/7129
Type:
Conference Proceedings

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