Exploring new metrology for complex photomask patterns

Exploring new metrology for complex photomask patterns

Author(s):

M. Higuchi ( Toppan Printing Co., Ltd., Japan )
T. Aihara ( Toppan Printing Co., Ltd., Japan )
H. Saito ( Toppan Printing Co., Ltd., Japan )
I. Yonekura ( Toppan Printing Co., Ltd., Japan )
J. Suzuki ( Toppan Printing Co., Ltd., Japan )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

2

Page(from):

71222S-1

Page(to):

71222S-10

Pages:

10

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 24. SEM CD Metrology, 71222S, 7122-100

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