Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Author(s):: M. S. Yeung ( Fastlitho, Inc., United States )
Publication title:: Photomask technology 2008
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 7122
Pub. Year:: 2008
Vol.:: 1
Page(from):: 71221T-1
Page(to):: 71221T-10
Pages:: 10
Pub. info.:: Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:: 0277786X
ISBN:: 9780819473554 [0819473553]
Language:: English
Call no.:: P63600/7122
Type:: Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 14. Simulation and Modeling I, 71221T, 7122-64

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