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Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow

Author(s):
  • J. H. Kang ( Dongbu HiTek Co., Ltd., South Korea )
  • J.-Y. Choi ( Dongbu HiTek Co., Ltd., South Korea )
  • Y.-A. Shim ( Dongbu HiTek Co., Ltd., South Korea )
  • H.-S. Lee ( Dongbu HiTek Co., Ltd., South Korea )
  • B. Su ( Anchor Semiconductor, United States )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
1
Page(from):
71221N-1
Page(to):
71221N-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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