Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow
- Author(s):
- J. H. Kang ( Dongbu HiTek Co., Ltd., South Korea )
- J.-Y. Choi ( Dongbu HiTek Co., Ltd., South Korea )
- Y.-A. Shim ( Dongbu HiTek Co., Ltd., South Korea )
- H.-S. Lee ( Dongbu HiTek Co., Ltd., South Korea )
- B. Su ( Anchor Semiconductor, United States )
- Publication title:
- Photomask technology 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7122
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 71221N-1
- Page(to):
- 71221N-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473554 [0819473553]
- Language:
- English
- Call no.:
- P63600/7122
- Type:
- Conference Proceedings
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