Practical laser mask repair in the contemporary production environment

Practical laser mask repair in the contemporary production environment

Author(s):

T. Robinson ( RAVE LLC, United States )
R. White ( RAVE LLC, United States )
M. Archuletta ( RAVE LLC, United States )
R. Bozak ( RAVE LLC, United States )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

1

Page(from):

71221J-1

Page(to):

71221J-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 12. Defect Repair, 71221J, 7122-54

Similar Items:

1 Conference Proceedings Nanomachining processes for 45, 32 nm node mask repair and beyond T. Robinson, A. Dinsdale, R. Bozak, R. White, M. Archuletta Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Use of nanomachining for subtractive repair of EUV and other challenging mask defects Brinkley, D., White, R., Bozak, R., Liang, T., Liu, G. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Nanomachining photomask repair of complex patterns T. Robinson, A. Dinsdale, M. Archuletta, R. Bozak, R. White Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Integration of photolithographic simulation and a mask repair system into a single concurrent work cell [5992-50] Robinson, T., Brooker, P., Bozak, R., Lee, D. A. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Application of photolithographic simulation and a mask repair system in a production environment [6283-45] Robinson, T., Lewellen, J., Bozak, R., Lee, A. D., Brooker, P. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Advanced mask particle cleaning solutions T. Robinson, A. Dinsdale, R. Bozak, B. Arruza Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Femtopulse laser-based mask repair in the DUV wavelength regime [6283-43] Ghadiali, F., Tolani, V., Nagpal, R., Robinson, T., LeClaire, J., Bozak, R., Lee, A. D., White, R. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Improved cycle time of mask repair by optimizing nanomachining with photolithographic imaging simulation [5853-90] Brooker, P., Robinson, T., Lewellen, J., Naber, B., Bozak, R., Lee, D. A., RAVE LLC (USA) SPIE - The International Society of Optical Engineering
5 Conference Proceedings Precise and high-throughput femtopulse laser mask repair of large defects [6349-171] White, R., LeClaire, J., Robinson, T., Dinsdale, A., Bozak, R., Lee, D. A. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Optimization of nanomachining repair condition for ArF lithography Amano, T., Nishiguchi, M., Hashimoto, H., Morikawa, Y., Hayashi, N., White, R., Bozak, R., Terrill, L. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Mask repair for the 65 nm technology node [5992-171] Robinson, T., Dinsdale, A., Bozak, R., White, R., Lee, D. A., Roessler, K. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Defect repair performance using the nanomachining repair technique Morikawa, Y., Kokubo, H., Nishiguchi, M., Hayashi, N., White, R., Bozak, R., Terrill, L. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12