Mask defect printability in the spacer patterning process
- Author(s):
- S. Miyoshi ( Toshiba Corp., Japan )
- S. Yamaguchi ( Toshiba Corp., Japan )
- T. Hirano ( Toshiba Corp., Japan )
- H. Mashita ( Toshiba Corp., Japan )
- H. Mukai ( Toshiba Corp., Japan )
- Publication title:
- Photomask technology 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7122
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 71220P-1
- Page(to):
- 71220P-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473554 [0819473553]
- Language:
- English
- Call no.:
- P63600/7122
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Mask quality assurance in cleaning for haze elimination using flexible mask specifications
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |