Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

Author(s):

T. Faure ( IBM Corp., United States )
E. Gallagher ( IBM Corp., United States )
M. Hibbs ( IBM Corp., United States )
L. Kindt ( IBM Corp., United States )
K. Racette ( IBM Corp., United States )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

1

Page(from):

712209-1

Page(to):

712209-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 2. Mask Materials for Optical Extensions, 712209, 7122-07

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