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Accuracy considerations for critical dimension semiconductor metrology

Author(s):
  • N. G. Orji ( National Institute of Standards and Technology, United States )
  • R. G. Dixson ( National Institute of Standards and Technology, United States )
  • B. D. Bunday ( International SEMATECH Manufacturing Initiative, United States )
  • J. A. Allgair ( International SEMATECH Manufacturing Initiative, United States )
Publication title:
Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7042
Pub. Year:
2008
Page(from):
70420A-1
Page(to):
70420A-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472625 [081947262X]
Language:
English
Call no.:
P63600/7042
Type:
Conference Proceedings

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