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Effects of pattern size, dual side patterning, and imprint materials in the fabrication of antireflective structure using nanoimprint

Author(s):
  • D.-G. Choi ( Korea Institute of Machinery and Materials, South Korea )
  • K. J. Lee ( Korea Institute of Machinery and Materials, South Korea )
  • K.-D. Kim ( Korea Institute of Machinery and Materials, South Korea )
  • J.-H. Choi ( Korea Institute of Machinery and Materials, South Korea )
  • J.-H. Jeong ( Korea Institute of Machinery and Materials, South Korea )
Publication title:
Nanoengineering : fabrication, properties, optics, and devices V : 13-14 August 2008, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7039
Pub. Year:
2008
Page(from):
70391E-1
Page(to):
70391E-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472595 [081947259X]
Language:
English
Call no.:
P63600/7039
Type:
Conference Proceedings

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