An IntenCD map of a reticle as a feed-forward input to DoseMapper
- Author(s):
- M. Ben Yishai ( Applied Materials, USA )
- J. Finders ( ASML, Netherlands )
- R. Kazinczi ( ASML, Netherlands )
- A. Bleeker ( ASML, Netherlands )
- P. Luehrmann ( ASML, Netherlands )
- Publication title:
- Photomask and next-generation lithography mask technology XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7028
- Pub. Year:
- 2008
- Vol.:
- 2
- Page(from):
- 70283H-1
- Page(to):
- 70283H-11
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- Language:
- English
- Call no.:
- P63600/7028
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Adaptive filtering and feed-forward control for suppression of vibration and jitter
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Analysis of Feed Characteristics on the Performance of Groove-Feed Extruders
Society of Plastics Engineers |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |