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Image placement error of photomask due to pattern loading effect: analysis and correction technique for sub-45 nm node

Author(s):
  • J. Choi ( Samsung Electronics Co., Ltd., South Korea )
  • S. H. Lee ( Samsung Electronics Co., Ltd., South Korea )
  • D. Nam ( Samsung Electronics Co., Ltd., South Korea )
  • B. G. Kim ( Samsung Electronics Co., Ltd., South Korea )
  • S. -G. Woo ( Samsung Electronics Co., Ltd., South Korea )
Publication title:
Photomask and next-generation lithography mask technology XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7028
Pub. Year:
2008
Vol.:
2
Page(from):
70281X-1
Page(to):
70281X-13
Pages:
13
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472434 [0819472433]
Language:
English
Call no.:
P63600/7028
Type:
Conference Proceedings

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