Blank Cover Image

The source of carbon contamination for EUV mask production

Author(s):
  • Y. Kim ( Hynix Semiconductor Inc., South Korea )
  • J. Lee ( Hynix Semiconductor Inc., South Korea )
  • Y. Choi ( Hynix Semiconductor Inc., South Korea )
  • C. Kim ( Hynix Semiconductor Inc., South Korea )
Publication title:
Photomask and next-generation lithography mask technology XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7028
Pub. Year:
2008
Vol.:
2
Page(from):
70281U-1
Page(to):
70281U-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472434 [0819472433]
Language:
English
Call no.:
P63600/7028
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]

Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Analysis of dry etch loading effect in mask fabrication

Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Lifetime of EUVL as a function of degree of carbon contamination and capping materials

S. Huh, H. Kim, G. Yoon, J. Choi, H.-S. Lee

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Comparative evaluation of mask production CAR development processes with stepwise defect inspection

Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings EUV mask inspection tool using high NA DUV inspection tool

Y. Choi, S. Oh, M. Kim, Y. Kim, C. Kim

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Extended capability of laser writer for masks beyond 180-nm nodes

Cho,S.-Y., Lee,J.-Y., Kim,C.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Production of High Density Plasma on the Substrate in a Helicon Source and application to the Deposition of SiOF Film with Low Dielectric Constant

Kim, J-H., Seo, S-H., Yun, S-M., Chang, H-Y., Choi, C-K., Lee, K-M.

Electrochemical Society
10 Conference Proceedings A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level

H. Lee, J. Choi, J. Jung, J. Oh, S. Kang

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Application of newly synthesized poly(hydroxystyrene-acrylate) copolymers to improve vacuum stability on E-beam resist for mask fabrication

Lee, D.-, Kim, S.-, Choi, D.-, Kim, D., Kim, J., Kim, C.-

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Ecperimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Kim,C.-H., Jeon,C.-U., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Required mask specification for mass production devices below 65-nm design node [6349-81]

Nam, D., Choi, S., Doh, J., Noh, Y., Lee, H., Sin, Y., Kim, B., Kang, M., Han, W.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings EUV mask process development and integration [6283-91]

Zhang, G., Yan, -Y. P., Liang, T., Du, Y., Sanchez, P., Park, S., Lanzendorf, J. E., Choi, J. C., Shu, Y. E., Stivers, …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12