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The lithography technology for the 32 nm HP and beyond

Author(s):
Publication title:
Photomask and next-generation lithography mask technology XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7028
Pub. date:
2008
Vol.:
1
Page(from):
702810-1
Page(to):
702810-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472434 [0819472433]
Language:
English
Call no.:
P63600/7028
Type:
Conference Proceedings

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