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The properties of ZnO thin films fabricated by ion beam sputtering and RF magnetron sputtering

Author(s):
  • X. X. He ( Hefei Univ. of Technology, China )
  • H. Q. Li ( Hefei Univ. of Technology, China )
  • J. B. Gu ( Hefei Univ. of Technology, China )
  • S. B. Wu ( Hefei Univ. of Technology, China )
  • B. Cao ( Hefei Univ. of Technology, China )
Publication title:
Sixth International Conference on Thin Film Physics and Applications
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6984
Pub. date:
2008
Page(from):
69842T-1
Page(to):
69842T-4
Pages:
4
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471826 [0819471828]
Language:
English
Call no.:
P63600/6984
Type:
Conference Proceedings

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