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Validation and application of a mask model for inverse lithography

Author(s):
  • T. H. Dam ( Luminescent Technologies, USA )
  • X. Zhou ( Luminescent Technologies, USA )
  • D. Chen ( Luminescent Technologies, USA )
  • A. Adamov ( Luminescent Technologies, USA )
  • D. Peng ( Luminescent Technologies, USA )
Publication title:
Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6925
Pub. Year:
2008
Page(from):
69251J-1
Page(to):
69251J-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471109 [0819471100]
Language:
English
Call no.:
P63600/6925
Type:
Conference Proceedings

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